氢氧化钾的使用比较频繁，特别是在化工行业的使用，关于这种物质的特性，想必大家还不是特别熟悉，下面小编主要来为大家讲解下氢氧化钾与镁合金微弧氧化的关系，一起来看下：
Potassium hydroxide is frequently used, especially in the chemical industry. I think you are not very familiar with the characteristics of this material. The following is a brief introduction to the relationship between this material and micro arc oxidation of magnesium alloy. Let's look at it together:
减小微弧氧化时，金属表面出现微小弧光所需的电压与电解液的电导率有直接关系。电解液的电导率越大，等离子体中的带电粒子在微弧氧化时形成的“金属一电介质一气体一电解液”四相体系中的传递和迁移更快，更有效，表面有膜层易被击穿而出现放电弧光，因而达到击穿电压所需的外加电压越低。
When the micro arc oxidation is reduced, the voltage required for the micro arc on the metal surface is directly related to the conductivity of the electrolyte. The greater the conductivity of electrolyte is, the faster the transfer and migration of charged particles in the four phase system of "metal dielectric gas electrolyte" formed by microarc oxidation is, the more effective it is. The film on the surface is easy to be broken down and the discharge arc appears, so the lower the applied voltage required to reach the breakdown voltage is.
Na2SiO3溶液中添加不同浓度氢氧化钾所获得的微弧氧化膜层厚度的变化曲线。膜层厚度随其浓度的增大而增加，但产品浓度增大到一定程度（≥1 .5g/L）时，膜层厚度增加趋势减缓，甚至不再增加。这可能是由于随产品浓度增大，膜层生长速率增加的同时，生成的膜层在其作用下的溶解速率也相应增加，从而导致膜层厚度不再增加。
The change curve of the thickness of micro arc oxidation film obtained by adding different concentration of potassium hydroxide in Na2SiO3 solution. The film thickness increases with the increase of its concentration, but when the product concentration increases to a certain extent (≥ 1.5g / L), the increasing trend of film thickness slows down, or even no longer increases. This may be due to the increase of the film growth rate with the increase of the product concentration, and the corresponding increase of the dissolution rate of the generated film under the action of the product concentration, so that the film thickness is no longer increased.

此外，还可发现，Na2SiO3溶液中不含KOH（即KOH浓度为零）时也能正常进行微弧氧化反应并成膜，说明KOH对AZ91C镁合金微弧氧化时具体的氧化成膜反应并无贡献，氢氧化钾的加入只是改变了溶液的成分和性质，影响到微弧氧化反应的过程，从而影响成膜的速率。
In addition, it can be found that Na2SiO3 solution without KOH (i.e. KOH concentration is zero) can also be subject to the normal micro arc oxidation reaction and film formation, which shows that KOH has no contribution to the specific micro arc oxidation reaction of az91c magnesium alloy. The addition of KOH only changes the composition and properties of the solution, affects the process of micro arc oxidation reaction, and thus affects the film formation rate.
通过以上文中讲解的内容，大家可以了解到氢氧化钾物质与镁合金微弧氧化的关系，希望文中讲解的知识点对大家有帮助作用，在以后的操作和使用这种物质时，多注意这方面的问题。
Through the above content, you can understand the relationship between potassium hydroxide and micro arc oxidation of magnesium alloy. I hope that the knowledge points explained in this paper will be helpful to you. In the future operation and use of this material, pay more attention to this problem.