氢氧化钾是常用的，尤其是在化工行业，关于这种材料的特性，我们一定不能特别熟悉，下面小编主要来解释一下这种材料与镁合金微弧氧化的关系，让我们一起来看看:
　　Potassium hydroxide is commonly used, especially in the chemical industry. We must not be particularly familiar with the characteristics of this material. The following small edition mainly explains the relationship between this material and micro arc oxidation of magnesium alloy. Let's take a look at it:
　　当微弧氧化降低时，金属表面出现微弧光所需的电压与电解液的电导率直接相关。电解质的导电率越高,越快转移和等离子体中带电粒子的迁移“金属-介质-气-电解质”四阶段系统形成在微弧氧化过程中,更有效的,膜层表面上很容易被分解和放电电弧光出现,因此,降低所需的外加电压达到击穿电压。
　　When the micro arc oxidation decreases, the voltage required for the micro arc light on the metal surface is directly related to the conductivity of the electrolyte. The higher the conductivity of the electrolyte, the faster the transfer and the migration of charged particles in the plasma. "Metal dielectric gas electrolyte" four-stage system is formed in the process of microarc oxidation, which is more effective. The film surface is easy to be decomposed and the discharge arc light appears. Therefore, reduce the required external voltage to reach the breakdown voltage.
　　在Na2SiO3溶液中加入不同浓度的氢氧化钾，得到微弧氧化膜厚度的变化曲线。膜厚随着浓度的增加而增加，但当产物浓度增加到一定程度(≥1.5g /L)时，膜厚的增加变缓甚至停止。这可能是由于这一事实,产物浓度的增加,膜层的生长速率的增加,生成的膜层和溶解率的作用下也相应增长,从而导致膜层的厚度增加。
　　Adding different concentration of potassium hydroxide into Na2SiO3 solution, the change curve of the thickness of micro arc oxidation film was obtained. The film thickness increased with the increase of concentration, but when the product concentration increased to a certain extent (≥ 1.5g / L), the increase of film thickness slowed down or even stopped. This may be due to the fact that the increase of product concentration, the increase of growth rate of the film, the corresponding increase of the generated film and dissolution rate, which leads to the increase of the thickness of the film.

　　此外，还可以发现，除了KOH在Na2SiO3溶液(即。KOH浓度为零)时也可以正常进行微弧氧化反应和成膜,显示的KOH AZ91C镁合金微弧氧化时特定的氧化膜和没有贡献的氢氧化钾只是改变了溶液的组成和性质,影响微弧氧化反应的过程,从而影响膜的速率。
　　In addition, in addition to KOH in Na2SiO3 solution (i.e. When KOH concentration is zero), the reaction and film formation can also be carried out normally. It is shown that the specific oxide film and the non contributing potassium hydroxide only change the composition and properties of the solution, affect the process of the reaction and thus affect the film rate.
　　通过以上文章所阐述的内容，我们可以了解氢氧化钾与镁合金微弧氧化的关系，希望文中所阐述的知识点能对您有所帮助，在以后的操作和使用中对这种材料更加重视这个问题。
　　Through the above contents, we can understand the relationship between potassium hydroxide and micro arc oxidation of magnesium alloy. We hope that the knowledge described in this paper can help you, and pay more attention to this problem in the future operation and use of this material.